Kinetics of Surface Roughening and Smoothing During Ion Sputtering
نویسندگان
چکیده
منابع مشابه
Origin of atomic clusters during ion sputtering.
Previous studies have shown that the size distributions of small clusters ( n < or = 40; n = number of atoms/cluster) generated by sputtering obey an inverse power law with an exponent between -8 and -4. Here we report electron microscopy studies of the size distributions of larger clusters ( n > or = 500) sputtered by high-energy ion impacts. These new measurements also yield an inverse power ...
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Low energy Ar ion sputtering, typically below 1,200 eV, of GaAs at normal beam incident angle is investigated. Surface morphology development with respect to varying energy is analyzed and discussed. Dot-like patterns in the nanometer scale are obtained above 600 eV. As the energy approaches upper eV range regular dots have evolved. The energy dependent dot evolution is evaluated based on solut...
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Recent experimental studies focusing on the morphological properties of surfaces eroded by ion-bombardment report the observation of self-affine fractal surfaces, while others provide evidence about the development of a periodic ripple structure. To explain these discrepancies we derive a stochastic growth equation that describes the evolution of surfaces eroded by ion bombardment. The coeffici...
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As extensive experimental studies have shown, under certain conditions, ion bombardment of solid targets induces a random (self-affine) morphology on the ion-eroded surfaces. The rough morphology development is known to cause substantial variations in the sputtering yields. In this article, we present a theoretical model describing the sputter yields from random, self-affine surfaces subject to...
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ژورنال
عنوان ژورنال: MRS Proceedings
سال: 1993
ISSN: 0272-9172,1946-4274
DOI: 10.1557/proc-317-91